JEOL - Oxford Particle Analysis Seminar 

Lunch will be provided from 12:30-1:30

Topics

1:30-2:15 Choose the right SEM platform to optimize particle analysis results

Donna Guarrera, JEOL USA Assistant Director, SM Division

Particle analysis results are determined by a number of factors, including the SEM platform used for the analysis.  Any SEM available, including Desktop, Tungsten, or Field Emission, is capable of being used for particle analysis.  The selection of a given SEM platform will depend on the information to be collected from samples.  Secondary electron and backscattered electron detector efficiency, stage size, low kV performance, and  sample holders used are important factors in results.  All aspects of the chosen SEM will be discussed.

2:15-3:00 Effective Steel Inclusion Analysis in the SEM

Warren MoberlyChan, Oxford Instruments America's

High strength specialty steels are increasingly utilized and important for a wide array of end products. One of the most important parameters that must be characterized and controlled is the “cleanliness” of the steel.  The cleanliness refers to the distribution, size, and chemical composition of the inclusions within the steel matrix.  The trend in high strength steels has been to control the inclusions to smaller sizes, lower distributions, and the restriction of some non-metallic inclusions from the final product.
The traditional methods of characterizing the inclusions included using light optical techniques that detected the larger inclusions at a high rate, but lacked the ability to detect the very small inclusions as well as lacked the ability to definitively characterize the chemical composition of the inclusions.  A better solution is required to improve the cleanliness and characterization of the steels.
Advancements in SEM and EDS technology allow for high speed location, imaging, and chemical characterization of inclusions.   This is done in a standard SEM (not a specialized particle analysis tool) with improved size and chemical detection limits.  Further, the large area high performance EDS detectors allow for characterization of non-metallic inclusions that are smaller than 500nm.  This is all while operating at speeds that are faster than specialized particle analysis electron microscope tools.
Modern steel cleanliness demands now require an SEM with EDS to characterize the increasingly smaller inclusions.  We will look at how to complete this enhanced analysis and the importance of using the appropriate SEM/EDS package.

3:00-3:45 Wear Debris Analysis and Component Cleanliness in the SEM for Industrial Requirements

Warren MoberlyChan, Oxford Instruments America’s 

Wear debris analysis and component cleanliness are important part of the quality assurance process that has been implemented to many manufacturing processes, in particular for the automotive and aviation industries.  Internationally recognized standards such as ISO16232-8 require that not only the quantity and morphology be characterized, but also the chemical composition of the particles be characterized.  
Historically, completing a wear debris and component cleanliness analysis via SEM/EDS was time consuming and often was deemed too slow for many manufacturing processes.  Specialized tools developed for this purpose to meet the speed demands, but lacked the abilities of a traditional SEM/EDS system.  These restrictions include the lack in ability to perform a wide range of high quality imaging, enhanced chemical analysis, or traditional element mapping.
Advancements in EDS detector technology as well as increased computing capacity now allows for wear debris analysis and component cleanliness to be completed with a SEM/EDS at rates that are faster than a specialized tool, but also with increased precision and enhanced data acquisition.  We will look at common applications that require wear debris analysis including the requirements defined by ISO16232.  We will show how a SEM with the Aztec Feature program will meet the application needs and best practices to ensure accurate results.

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